photolithography是什么意思_photolithography的音标_用法_翻译_短语搭配_权威例句

柯林斯词典

同根词

词根：photographer

• adj.

  photomechanical 照相工艺的

• adv.

  photographically 用照相；逼真地

• n.

  photographer 摄影师；照相师

  photogravure 凹版照相；凹版印刷

  photolithograph 影印石版画；照相平版印刷品

  photomechanical 照相制版工艺；照相制版法

  photomontage 蒙太奇照片；集锦照相

• vt.

  photogravure 用凹版印刷；用凹版印刷复制

  photolithograph 影印石版

词组短语

1. relaxed registration photolithography 不严格对准光刻

2. contact photolithography 接触光蚀刻

3. Photolithography process 光刻工艺

4. projection photolithography 投影光刻法

5. photolithography mask layers 光石版照相罩幕层

6. e-beam photolithography 电子束显影法 ; 电子束微影术

7. photolithography limitation 电子 光刻极限

8. precision photolithography 精密光刻

9. photolithography technique 电子 光刻工艺

权威例句

1. The patterned anodic aluminum oxide (AAO) template was fabricated by UV-photolithography.

采用紫外光刻法制得图案化的阳极氧化铝模板。

2. To make a TFT-LCD panel which has higher performance, fine patterning process of photolithography is needed. Making smaller via pattern is one of main issue for fine patter - ning.

为了获得更高性能的TFT - LCD面板，在光刻时保证精细的图形成像十分重要，其中，如何制作出尺寸更小的通孔图形是主要的问题之一。

3. The patterned anodic aluminum oxide ( AAO ) template was fabricated by UV photolithography.

采用紫外光刻法制得图案化的阳极 氧化铝 模板.《互联网》

4. The micro-maching technology major include photolithography and etching technology.

微加工技术主要包括光刻技术和刻蚀技术。

5. The utility model can protect the film from pollution and increases the printing quality of photolithography during the production of semiconductor integrated circuits.

本实用新型可保护薄膜不受污染，提高半导体集成电路生产过程中的照相平版印刷质量。

6. This paper introduces a new near-field photolithography technology.

介绍了一种新的近场光刻技术的基本原理及其在光刻方面的应用研究的最新进展。

7. In 1991 they published a paper that made the cover of the journal Science, describing how photolithography could be used to direct light to activate the synthesis of biological compounds.

并就此于1991年发表的文章成为《科学》杂志的封面文章阐述了影像平面印刷技术如何能够直接激活生物物质的信息汇总。

8. Involved in the process include: oxidation, photolithography, etching, injection process.

所涉及到的工艺主要包括：氧化工艺、光刻工艺、注入工艺、刻蚀工艺。

9. Proximity Photolithography There is almost nothing on the study of "designer system".

直接针对科技型企业设计师系统的研究，更是接近于空白。

10. In chapter 3, the process technology of silicon mold by means of photolithography and wet etching was introduced, which is a important process of hot embossing technology.

第三章介绍的是热压工艺中的一个重要工艺环节——硅阳模制作工艺。

11. We also get preliminary results for mask layer deposition, photolithography and etching.

此外，还得到一些掩模层制备、光刻、刻蚀等工艺测试的初步结果。

12. Seven figures of masks for photolithography have also been drawn with BASIC language.

并用BAsic语言绘制出所需的七块光刻掩膜图。

13. The Photolithography Alignment system Using Gratings with Different Constant

应用不等栅距光栅的光刻对准系统

14. From an industrial standpoint, manufacturers of microchip devices use these deep excimer lasers for high-resolution photolithography.

从工业角度来看，微芯片设备制造商使用这些深准分子激光器用于高分辨率光刻。

15. Spherical aberration can damage image quality in photolithography.

球面像差能破坏光刻的成像质量。

16. Fractional Fourier Domain Filtering Applied to Improve Image Quality in Photolithography

分数傅立叶滤波改善光刻成像质量

17. Long focal depth photolithography for obtaining nanometer array patterns with multi-beam interference

用多光束干涉实现纳米级阵列图形的长焦深光刻

18. Systematic Control Exploitation for Critical Dimension and Overlay in Photolithography Technology

光刻工艺中对线宽和套刻系统性控制的开发

19. Design and construction of an ultrahigh vacuum evaporation equipment for atom photolithography Used Equipment

原子光刻用超高真空蒸发设备的设计和建立

20. The business unit's capabilities including photolithography, micro-etch and small scale thermal dissipation technology.

该业务部门的技术能力包括照相平版印刷、微蚀刻和小规模散热技术。

21. Preliminary research of contact photolithography by using a UV excimer laser

用紫外准分子激光器进行接触式光刻的初步研究

22. Dynamic Scheduling of Photolithography Process Based on Kohonen Neural Network

基于Kohonen神经网络的晶圆光刻流程动态调度方法

23. One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists.

规程的当中一个被使用在做整体集成电路克服这个问题是石版影印根据光致抗蚀剂。

24. Optimization of Photolithography Process Parameters

光刻工艺参数的优化方法

25. Up to now the technology of proximity photolithography has been applied widely.

到目前为止，接近光刻技术已得到广泛地应用。

26. The orthogonal test method is used to arrange thick film photolithography experiments on the appropriate working conditions.

采用合适的工作条件，提出以正交试验法安排厚胶光刻实验，对所得到的实验结果进行极差分析，优化各工艺参数，得到适用于正胶AZ4620的光刻工艺参数组合。

27. This paper introduces a fabricated method of using fused silica as the chip material. It includes standard photolithography, wet chemical etching and bonding techniques.

本文介绍了选用优质石英为芯片基体材料的一种制作方法，关键技术包括标准的光刻，湿法腐蚀，键合等微加工技术。

28. The simulation analysis for photolithography process of microlens array

微透镜列阵光刻工艺过程的模拟与分析

29. Optical Design and Manufacture of I Line Projection Lens for Submicrometer Photolithography

亚微米i线投影光刻物镜的光学设计与研制

30. New Filtering Approach on Partial Coherent Imaging System for Improving Photolithography Resolution

部分相干分数域滤波改善光刻分辨率新方法

31. Therefore, the stability of the Photolithography process is significant for research to ensure product quality.

所以，对光刻工艺的稳定性进行研究对保证产品质量有着重要的意义。

32. The copper electrode couple preparation step prepares the copper electrode couples with a plurality of micrometers of relative spacing by a yellow-light photolithography process.

铜电极偶制备步骤，为利用黄光微影制程制作出相对间距为数微米的铜电极 偶。

33. With 300 lines of Photolithography and screen resolution, with cyberctm indosinian.

如果采用300线网屏的特技照相制版,就可获得有动感的印成品了.《互联网》

34. The photo-induced etching effect, or development-free vapor photolithography is a very interesting phenomenon.

光致诱蚀作用或无显影气相光刻作用是一个非常有趣的现象。

35. There, he and his colleagues devised a scheme to marry photolithography, a technology used in semiconductor fabrication, to combinatorial chemistry.

正是在那，他与他的研究人员一起将用于半导纤维的技术-影像平面印刷技术与组合化学嫁接到了一起。

36. Deadlock-Free Scheduling Algorithm of Photolithography Equipment

光刻设备TRACK系统的无死锁调度算法

37. Calculation& Simulation of Intensity Distribution of I Line Uniform Illumination Optical System for Photolithography

i－line光刻高均匀照明系统光能分布的计算模拟

38. Influences of side-wall slope of photolithography pattern on characteristic dimensions after ion implantation are analyzed.

分析了光刻图形侧墙斜坡对离子注入后图形特征尺寸的影响。

39. The study of manufacturing large NA binary lens using the phase-shift photolithography

用相移掩模光刻技术制作大相对孔径二元透镜的研究

40. Alignment Precision - Displacement of patterns that occurs during the photolithography process.

套准精度 - 在光刻工艺中转移图形的精度.《互联网》

41. Photolithography combined with etching technique is the most commonly used technique for fabrication of silicon, glass and quartz microfluidic chips.

光刻和蚀刻技术常用于加工硅、玻璃和石英芯片。

42. A first photolithography process forms first and second diffusion trench openings for the first and second diffusion regions.

第一光刻工艺为第一和第二扩散区形成了第一和第二扩散沟槽开口。

43. Trend of Photolithography Technology and Its Equipment in 21st Century

新世纪光刻技术及光刻设备的发展趋势

44. In this paper, the principle, construction and function of a new near photolithography system for manufacturing circular gratings are introduced.

本文介绍制造回光栅所采用的一种新型接近式光刻系统的原理、结构和光刻性能。

45. Why not use photolithography to make nano structures?

为什么不使用光蚀刻法制造奈米结构？

46. First, consider the advantages and disadvantages of photolithography.

首先，想想光蚀刻法的优点跟缺点。

47. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more.

课堂讲授和实验课重点介绍了基本制程技术，如扩散、氧化、光刻、化学气相沉积等。

48. Five Key Element to the Full Production of 0 18 μ m Photolithography

解决0.18μm光刻批量生产的五大技术要素

49. The pixel structure is removed by optimizing the parameters of imaging system rather than other techniques that make the setup of digital photolithography complexity.

提出用优化成像系统设计参量的方法有效消除基于数字微镜阵列的栅格结构及其衍射对微结构成像质量的影响。

50. Research of intensity distribution of uniform illumination system for optical photolithography exposure

曝光均匀照明系统光照均匀性研究

51. In Fig . 3 B, avidin protein was printed by photolithography onto a biotinylated PSI surface.

三号乙, 抗生物素蛋白印刷光刻到生物防扩散表面.《互联网》

52. Evanescent wave fiber-optic sensors (EWFS) with acicular encapsulation were fabricated using silicon photolithography technology and silica wet-etching technology.

用硅光刻工艺和二氧化硅湿法腐蚀工艺制作了针状封装结构的光纤消逝场传感器。

53. The method is simple and provides a new way to improve the imaging quality in digital photolithography.

数字灰度曝光技术简单易行，可为改善光刻图形质量提供了新途径。

54. Analysis of standing wave effect in photolithography

光刻中驻波效应的影响分析

55. The prototype of the micro actuator is fabricated by means of micro electroforming and SU-8 photolithography techniques.

利用SU-8光刻胶制备电铸模和微电铸工艺，制造了二维微执行器原型。

56. There has been a great interest in such structured films due to its potential applications in photolithography, near field microscopy and photonic devices.

这种结构的金属薄膜在光印刷、近场显微镜和光子器件等方面有着广泛的应用前景，近年来引起了人们的重视。

57. A Study on Improving Imaging Resolution of Projection Photolithography with Pupil Filtering

光瞳滤波提高投影光刻成像分辨力研究

58. Firstly the poly(dimethylsiloxane) (PDMS) elastomeric stamp used in soft lithography was fabricated by the photolithography technique.

本文还用微印刷技术证实了聚电解质多层膜的可压缩性。

59. The array electrodes were produced by method of photolithography and stripping. and a PDMS-glass microfluidic chip integrating the array of electrodes was bonded efficiently.

采用光刻法和剥离法进行了阵列电极的制作，并成功键合了带有阵列电极的PD MS -玻璃混合微流控芯片。

60. Atom photolithography is a new application of atom optics in microfabrication technical field.

原子光刻是原子光学在微细加工技术领域的新应用.《互联网》

61. The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique.

首先，采用紫外光刻和化学湿法刻蚀技术在玻璃基片上加工微米深度的微通道；

62. To create intricate patterns of many different types of bacteria, Weibel borrowed a technique from the computer chip industry called photolithography.

为了精细地制造各种不同的细菌排列，Weibel借用了计算机芯片制造中的微影技术。

实用例句

1. In the past, HP created inkjet print heads through a complex procedure where some parts were built using photolithography and other pieces were built using a mechanical process.

FORBES

2. Normally, the various parts of a transistor are made using photolithography.

ECONOMIST: Transistors: A tall story | The

3. All new print heads will be built using photolithography, and all from one piece of plastic.

FORBES: HP Finally Delivers On 'Invent'

4. Both of these surfaces would be created by photolithography, the process used to make computer chips.

ECONOMIST: Solar power

5. The technique should hold up in the real world despite ditching typical photolithography, the company says: the nanoimprinting remains useful in the error-prone world of storage, and it should scale as the patterns get smaller.

ENGADGET

6. The problem is that photolithography and etching are not perfectly accurate, so not all the resulting transistors are the same size.

ECONOMIST: Transistors: A tall story | The